Improved CD control and line edge roughness in E-beam lithography through combining proximity effect correction with gray scale techniques
Bolten, Jens, Wahlbrink, Thorsten, Koo, Namil, Kurz, Heinrich, Stammberger, Stefan, Hofmann, Uli, Ünal, Nezih
Published in Microelectronic engineering (01.05.2010)
Published in Microelectronic engineering (01.05.2010)
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Easy to adapt electron beam proximity effect correction parameter calibration based on visual inspection of a “Best Dose Sensor”
Unal, Nezih, Charlton, Martin D.B., Wang, Yudong, Waizmann, Ulrike, Reindl, Thomas, Hofmann, Ulrich
Published in Microelectronic engineering (01.08.2011)
Published in Microelectronic engineering (01.08.2011)
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Advanced mask aligner lithography (AMALITH) for thick photoresist
Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Hennemeyer, Marc, Zoberbier, Ralph, Voigt, Anja, Grützner, Gabi, Ünal, Nezih, Hofmann, Ulrich
Published in Microsystem technologies (01.10.2014)
Published in Microsystem technologies (01.10.2014)
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Third dimension of proximity effect correction (PEC)
Unal, Nezih, Mahalu, Diana, Raslin, Olga, Ritter, Daniel, Sambale, Christoph, Hofmann, Ulrich
Published in Microelectronic engineering (01.05.2010)
Published in Microelectronic engineering (01.05.2010)
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Benchmark test of Monte-Carlo simulation for high resolution electron beam lithography
Rommel, Marcus, Hoffmann, Karl E., Reindl, Thomas, Weis, Jürgen, Unal, Nezih, Hofmann, Ulrich
Published in Microelectronic engineering (01.10.2012)
Published in Microelectronic engineering (01.10.2012)
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Sample support
Peters, Ralf-Peter, Ünal, Nezih, Osterloh, Dirk Klaus, Backes, Herbert
Year of Publication 14.07.2009
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Year of Publication 14.07.2009
Patent
SAMPLE SUPPORT
OSTERLOH, DIRK KLAUS, BACKES, HERBERT, PETERS, RALF-PETER, UNAL, NEZIH
Year of Publication 08.03.2005
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Year of Publication 08.03.2005
Patent
SAMPLE SUPPORT
OSTERLOH, DIRK KLAUS, PETERS, RALF-PETER, BACKES, HERBERT, UNAL, NEZIH
Year of Publication 07.12.2001
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Year of Publication 07.12.2001
Patent