Physical characterization of sub-32-nm semiconductor materials and processes using advanced ion beam-based analytical techniques
Hopstaken, M. J. P., Pfeiffer, D., Copel, M., Gordon, M. S., Ando, T., Narayanan, V., Jagannathan, H., Molis, S., Wahl, J. A., Bu, H., Sadana, D. K., Czornomaz, L., Marchiori, C., Fompeyrine, J.
Published in Surface and interface analysis (01.01.2013)
Published in Surface and interface analysis (01.01.2013)
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Journal Article
Conference Proceeding
Small silicon memories: confinement, single-electron,. and interface state considerations
Tiwari, S, Wahl, J A, Silva, H, Rana, F, Welser, J J
Published in Applied physics. A, Materials science & processing (01.10.2000)
Published in Applied physics. A, Materials science & processing (01.10.2000)
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Journal Article
Variable penetration rate cone testing for characterization of intermediate soils
DeJong, J T, Jaeger, R A, Boulanger, R W, Randolph, M F, Wahl, D A J
Published in Geotechnical and Geophysical Site Characterization : Proceedings of the 4th International Conference on Site Characterization ISC-4 (01.01.2013)
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Published in Geotechnical and Geophysical Site Characterization : Proceedings of the 4th International Conference on Site Characterization ISC-4 (01.01.2013)
Conference Proceeding
(Invited) Extending Advanced CMOS Scaling with SiGe Channel Materials
Carter, Rick J, Sporer, Ryan, McArdle, Timothy J, Mulfinger, George Robert, Holt, Judson Robert, Beasor, Scott, Child, Amy, Fronheiser, Jody, Wahl, Jeremy A, Geisler, Holm, Kluth, George J, Triyoso, Dina H, Punchihewa, Kasun, Rana, Uzma, Vanamurthy, Laks, Sohn, D K
Published in ECS transactions (09.04.2018)
Published in ECS transactions (09.04.2018)
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Journal Article
(Invited) Factors Impacting Threshold Voltage in Advanced CMOS Integration: Gate Last (FINFET) vs. Gate First (FDSOI)
Triyoso, Dina, Carter, Rick, Kluth, Jon, Luning, Scott, Child, Amy, Wahl, Jeremy, Mulfinger, Bob, Punchihewa, Kasun, Kumar, Anil, Kang, Laegu, Sporer, Ryan, Chen, Xiaobo, Straub, Sherry, Bohra, Girish, Patil, Suraj, Zhang, Xing, Chen, Alex, Togo, Mitsuhiro, Pal, Rohit
Published in ECS transactions (08.09.2015)
Published in ECS transactions (08.09.2015)
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Journal Article
Enhancing computer ethics by increasing collaboration and peer learning
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Conference Proceeding
Small silicon memories: confinement, single-electron,. and interface state considerations
Tiwari, S., Wahl, J.A., Silva, H., Rana, F., Welser, J.J.
Published in Applied physics. A, Materials science & processing (01.10.2000)
Published in Applied physics. A, Materials science & processing (01.10.2000)
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Journal Article
Small silicon memories : confinement, single-electron, and interface state considerations : Semiconductor nanostructures: fundamentals and applications
TIWARI, S, WAHL, J. A, SILVA, H, RANA, F, WELSER, J. J
Published in Applied physics. A, Materials science & processing (2000)
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Published in Applied physics. A, Materials science & processing (2000)
Journal Article
Modifications of growth of strained silicon and dopant activation in silicon by cryogenic ion implantation and recrystallization annealing
Itokawa, H., Berliner, N. C., Teehan, S., Wall, D. R., Wahl, J. A., Eunha Kim, Li, J., Demarest, J. J., Ronsheim, P., Paruchuri, V.
Published in 2012 12th International Workshop on Junction Technology (01.05.2012)
Published in 2012 12th International Workshop on Junction Technology (01.05.2012)
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Conference Proceeding
Effect of water quality on the bonding of resin to moist dentin
Wahl, Andrew J, Combe, Edward C, Polack, Mariano A, Martens, Leslie V
Published in American journal of dentistry (01.04.2002)
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Published in American journal of dentistry (01.04.2002)
Journal Article