Electrolyte Additive Chemistry and Feature Size-Dependent Impurity Incorporation for Cu Interconnects
Kelly, James, Nogami, Takeshi, Parks, Christopher, Van der Straten, O., Demarest, James, Li, Juntao, DeHaven, Patrick, Hu, Chao-Kun, Liniger, Eric, Penny, Chris, Vo, Tuan
Published in Meeting abstracts (Electrochemical Society) (01.08.2011)
Published in Meeting abstracts (Electrochemical Society) (01.08.2011)
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