A Novel Resist Freeze Process for Double Imaging
Abdallah, David J., Alemy, Eric, Chakrapani, Srinivasan, Padmanaban, Murirathna, Dammel, Ralph R.
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Journal Article
Freezing Materials For Double Patterning
Lee, Dong-Kwan, Cao, Yi, Abdallah, David, Yin, Jian, Thiyagarajan, Muthiah, Dammel, Ralph
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article
193 nm Immersion Lithography - Taking The Plunge
Dammel, Ralph, Houlihan, Frank M., Sakamuri, Raj, Rentkiewicz, David, Romano, Andrew
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
Carborane-Based Photoacid Generators: New Superacids For 193 nm And EUV Lithography
Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van
Published in Journal of Photopolymer Science and Technology (2007)
Published in Journal of Photopolymer Science and Technology (2007)
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Journal Article
Possible Origins and Some Methods to Minimize LER
Padmanaban, Murirathna, Rentkiewicz, David, Hong, Chisun, Lee, Dongkwa, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph R.
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
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Journal Article
Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography
Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van
Published in Journal of photopolymer science and technology (2007)
Published in Journal of photopolymer science and technology (2007)
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Journal Article
Responding to the Challenge: Materials Design for Immersion Lithography
Padmanaban, Munirathna, Romano, Andrew, Lin, Guanyang, Chiu, Simon, Timko, Allen, Houlihan, Frank, Rahman, Dalil, Dammel, Ralph R., Turnquest, Karen, Rich, Georgia, Shuetter, Scott D., Shedd, Timonthy A., Nellis, Gregory A.
Published in Journal of Photopolymer Science and Technology (2006)
Published in Journal of Photopolymer Science and Technology (2006)
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Journal Article
Leaching Phenomena and their Suppresion in 193 nm Immersion Lithography
Dammel, Ralph R., Pawlowski, Georg, Romano, Andrew, Hoolihan, Frank M., Kim, Woo-Kyu, Sakmuri, Raj, Abdallah, David, Padmanaban, Murirathna, Rahman, M. Dalil, McKenzie, Douglas
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
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Journal Article
Novel Diamantane Polymer Platform for Resist Applications
Padmanaban, Murirathna, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph, Liu, Shenggao, Lam, Feederick, Maehara, Takayuki, Iwasaki, Fimiaki, Yamaguchi, Masao
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
New Fluorinated Resins for 157 nm Lithography Application
Houlihan, Francis, Romano, Andrew, Rentkiewicz, David, Sakamuri, Raj, Dammel, Ralph R., Conley, Will, Rich, Georgia, Miller, Daniel, Rhodes, Larry, McDaniels, Joe, Chang, Chun
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article
193 nm Resist Line Collapse Study by Modifying the Resist Polymer and Process Conditions with Utilizing FIRM Process
Tanaka, Keiichi, Yamada, Yoshiaki, Masuda, Seiya, Kobayashi, Masakazu, Kim, Woo-Kyu, Anyadiegwu, Clement, Padamanaban, Murirathna, Dammel, Ralph R.
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
Recent Advances in the Design of Resist Materials for 157 nm Lithography
Houlihan, Francis, Sakamuri, Raj, Romano, Andrew, Rentkiewicz, David, Dammel, Ralph, Stephanko, Nickolay, Market, M., Vermeir, U. Mierau Inge, Hohle, Christoph, Conley, Sill, Miller, Daniel, Itani, Toshiro, Shigematus, Masato, Kawaguchi, Etsuo
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
기판 위에 편석층을 제조하는 방법, 및 소자를 제조하는 방법
DAMMEL RALPH R, OCYTKO KORNEL, HUDSON DANIEL, MORSE GRAHAM, KUDO TAKANORI, WANG CHANGSHENG, JEFFERY BEN
Year of Publication 14.11.2022
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Year of Publication 14.11.2022
Patent
Etch Properties of 193nm Resists: Issues and Approaches
Padmanaban, Munirathna, Alemy, Eric, Dammel, Ralph, Kim, Woo-Kyu, Kudo, Takanori, Lee, SangHo, Rahman, Dalil, Chen, Wan-Lin, Sadjadi, Reza M., Livesay, William, Ross, Matthew
Published in Journal of Photopolymer Science and Technology (2002)
Published in Journal of Photopolymer Science and Technology (2002)
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Journal Article