Novel Diamantane Polymer Platform for Resist Applications
Padmanaban, Murirathna, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph, Liu, Shenggao, Lam, Feederick, Maehara, Takayuki, Iwasaki, Fimiaki, Yamaguchi, Masao
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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