Reduction of linewidth variation over reflective topography
Miura, Steve S, Lyons, Christopher F, Brunner, Timothy A
Published in Proceedings of SPIE (01.06.1992)
Published in Proceedings of SPIE (01.06.1992)
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Manufacturability of the ultrathin resist process
Pike, Christopher, Bell, Scott, Plat, Marina V, King, Paul, Nguyen, Khanh B, Lyons, Christopher F, Levinson, Harry J, Phan, Khoi A, Okoroanyanwu, Uzodinma
Published in Proceedings of SPIE (21.07.2000)
Published in Proceedings of SPIE (21.07.2000)
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Improved resist profiles and CD control through optimized thin dielectric stacks
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Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation
Plat, Marina V, Brunsvold, William R, Smith, Randolph S, Eib, Nicholas K, Lyons, Christopher F
Published in Proceedings of SPIE (01.01.1995)
Published in Proceedings of SPIE (01.01.1995)
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Deep-UV reflection control for patterning dielectric layers
Subramanian, Ramkumar, Bains, Gurjeet S, Lyons, Christopher F, Singh, Bhanwar, Gallardo, Ernesto
Published in Proceedings of SPIE (29.06.1998)
Published in Proceedings of SPIE (29.06.1998)
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ANTIREFLECTIVE COATING FILMS
LYONS, CHRISTOPHER F, MOREAU, WAYNE M, WOOD, ROBERT L, HEFFERON, GEORGE J, BRUNSVOLD, WILLIAM R
Year of Publication 13.02.1996
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Year of Publication 13.02.1996
Patent
Novel DNQ PACs for high-resolution i-line lithography
Brunsvold, William R, Eib, Nicholas K, Lyons, Christopher F, Miura, Steve S, Plat, Marina V, Dammel, Ralph R, Evans, O. B, Rahman, M. D, Khanna, Dinesh N, Jain, Sangya, Lu, Ping-Hung, Ficner, Stanley A
Published in Proceedings of SPIE (01.06.1992)
Published in Proceedings of SPIE (01.06.1992)
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