The Potential for Economic Application of Maskless Lithography in Semiconductor Manufacturing
Berglund, C.N., Leachman, R.C.
Published in IEEE transactions on semiconductor manufacturing (01.02.2010)
Published in IEEE transactions on semiconductor manufacturing (01.02.2010)
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Trends in systematic nonparticle yield loss mechanisms and the implications for IC design
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Journal Article
High-throughput mapping of short-range spatial variations using active electrical metrology
Xu Ouyang, Berglund, C.N., Fabian, R.
Published in IEEE transactions on semiconductor manufacturing (01.02.2002)
Published in IEEE transactions on semiconductor manufacturing (01.02.2002)
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Journal Article
Resist charging in electron-beam lithography
Bai, Min, Pickard, Daniel S, Tanasa, Corina, McCord, Mark A, Berglund, C. Neil, Pease, Roger Fabian W
Published in Proceedings of SPIE (18.12.1998)
Published in Proceedings of SPIE (18.12.1998)
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Conference Proceeding
Cost/benefit assessment of maskless lithography
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Journal Article
Mask Cost and Profitability in Photomask Manufacturing: An Empirical Analysis
Weber, C.M., Berglund, C.N., Gabella, P.
Published in IEEE transactions on semiconductor manufacturing (01.11.2006)
Published in IEEE transactions on semiconductor manufacturing (01.11.2006)
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Journal Article
Benchmarking the Productivity of Photomask Manufacturers
Berglund, C.N., Weber, C.M., Gabella, P.
Published in IEEE transactions on semiconductor manufacturing (01.11.2009)
Published in IEEE transactions on semiconductor manufacturing (01.11.2009)
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Journal Article
Benchmarking the productivity of photomask manufacturers
Berglund, C. Neil, Weber, Charles M, Gabella, Patricia
Published in Proceedings of SPIE (06.10.2006)
Published in Proceedings of SPIE (06.10.2006)
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Conference Proceeding
An Empirical Study of Photomask Manufacturing Productivity
Berglund, C.N., Weber, C.M., Castilla, C.
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
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Conference Proceeding
High-throughput high-density mapping and spectrum analysis of transistor gate length variations in SRAM circuits
Xu Ouyang, Deeter, T., Berglund, C.N., Pease, R.F.W., Lee, J., McCord, M.A.
Published in IEEE transactions on semiconductor manufacturing (01.11.2001)
Published in IEEE transactions on semiconductor manufacturing (01.11.2001)
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