(Invited) Thin Epitaxial Film of Ge and III-V Directly Bonded onto Si Substrate
Maeda, Tatsuro, Mieda, Eiko, Ishii, Hiroyuki, Itatani, Taro, Hattori, H, Yasuda, Tetsuji, Maeda, Atsuhiko, Kurashima, Yuichi, Takagi, Hideki, Aoki, T, Yamamoto, T, Ichikawa, Osamu, Osada, T, Takada, T, Hata, Masahiko, Yugami, J, Ogawa, A, Kikuchi, T, Kunii, Y
Published in ECS transactions (12.08.2014)
Published in ECS transactions (12.08.2014)
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Journal Article
Reduction of Threshold Voltage by Diffusion Control Technique in p-MISFETs Using Poly-Si/TiN/HfSiON Gate Stacks
Kawahara, T., Nishida, Y., Sakashita, S., Mizutani, M., Inoue, M., Yamanari, S., Higashi, M., Hayashi, T., Murata, N., Honda, K., Yugami, J., Yoshimura, H., Yoneda, M.
Published in IEEE electron device letters (01.10.2007)
Published in IEEE electron device letters (01.10.2007)
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Journal Article
Negative bias temperature instability of pMOSFETs with ultra-thin SiON gate dielectrics
Tsujikawa, S., Mine, T., Watanabe, K., Shimamoto, Y., Tsuchiya, R., Ohnishi, K., Onai, T., Yugami, J., Kimura, S.
Published in 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual (2003)
Published in 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual (2003)
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Conference Proceeding
Suppression of anomalous threshold voltage increase with area scaling for Mg- or La-incorporated high-k/Metal gate nMISFETs in deeply scaled region
Morooka, T, Sato, M, Matsuki, T, Suzuki, T, Shiraishi, K, Uedono, A, Miyazaki, S, Ohmori, K, Yamada, K, Nabatame, T, Chikyow, T, Yugami, J, Ikeda, K, Ohji, Y
Published in 2010 Symposium on VLSI Technology (01.06.2010)
Published in 2010 Symposium on VLSI Technology (01.06.2010)
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Conference Proceeding
Bit-line clamped sensing multiplex and accurate high voltage generator for quarter-micron flash memories
Kawahara, T., Kobayashi, T., Jyouno, Y., Saeki, S.-i., Miyamoto, N., Adachi, T., Kato, M., Sato, A., Yugami, J., Kume, H., Kimura, K.
Published in IEEE journal of solid-state circuits (01.11.1996)
Published in IEEE journal of solid-state circuits (01.11.1996)
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Journal Article
Advantages of gate work-function engineering by incorporating sub-monolayer Hf at SiON/poly-Si interface in low-power CMOS
Shimamoto, Y., Yugami, J., Inoue, M., Mizutani, M., Hayashi, T., Shiga, K., Fujita, F., Yoneda, M., Matsuoka, H.
Published in Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005 (2005)
Published in Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005 (2005)
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Conference Proceeding
Significant improvement in reliability of HfSiON gate insulator
Inoue, M., Yugami, J., Fujita, T., Shiga, K., Mizutani, M., Nomura, K., Tsuchimoto, J., Ohno, Y., Yoneda, M.
Published in 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual (2005)
Published in 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual (2005)
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Conference Proceeding
Evaluation of mobility in the MOSFET with high leakage current
Tonomura, O., Shimamoto, Y., Torii, K., Hiratani, M., Saito, S., Yugami, J.
Published in International Conference on Microelectronic Test Structures, 2003 (2003)
Published in International Conference on Microelectronic Test Structures, 2003 (2003)
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Conference Proceeding
An ultra-thin silicon nitride gate dielectric with oxygen-enriched interface (OI-SiN) for CMOS with EOT of 0.9 nm and beyond
Tsujikawa, S., Mine, T., Shimamoto, Y., Tonomura, O., Tsuchiya, R., Ohnishi, K., Hamamura, H., Torii, K., Onai, T., Yugami, J.
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
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Conference Proceeding
Femto-second CMOS technology with high-k offset spacer and SiN gate dielectric with oxygen-enriched interface
Tsuchiya, R., Ohnishi, K., Horiuchi, M., Tsujikawa, S., Shimamoto, Y., Inada, N., Yugami, J., Ootsuka, F., Onai, T.
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
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Conference Proceeding
Impact of SiON on embedded nonvolatile MNOS memory
Ishimaru, T., Matsuzaki, N., Okuyama, Y., Mine, T., Watanabe, K., Yugami, J., Kume, H., Ito, F., Kawashima, Y., Sakai, T., Kanamaru, Y., Ishii, Y., Mizuno, M., Kamohara, S., Hashimoto, T., Okuyama, K., Kuroda, K., Kubota, K.
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
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Conference Proceeding