Physical characterization of sub-32-nm semiconductor materials and processes using advanced ion beam-based analytical techniques
Hopstaken, M. J. P., Pfeiffer, D., Copel, M., Gordon, M. S., Ando, T., Narayanan, V., Jagannathan, H., Molis, S., Wahl, J. A., Bu, H., Sadana, D. K., Czornomaz, L., Marchiori, C., Fompeyrine, J.
Published in Surface and interface analysis (01.01.2013)
Published in Surface and interface analysis (01.01.2013)
Get full text
Journal Article
Conference Proceeding
Small silicon memories: confinement, single-electron,. and interface state considerations
Tiwari, S, Wahl, J A, Silva, H, Rana, F, Welser, J J
Published in Applied physics. A, Materials science & processing (01.10.2000)
Published in Applied physics. A, Materials science & processing (01.10.2000)
Get full text
Journal Article
Variable penetration rate cone testing for characterization of intermediate soils
DeJong, J T, Jaeger, R A, Boulanger, R W, Randolph, M F, Wahl, D A J
Published in Geotechnical and Geophysical Site Characterization : Proceedings of the 4th International Conference on Site Characterization ISC-4 (01.01.2013)
Get full text
Published in Geotechnical and Geophysical Site Characterization : Proceedings of the 4th International Conference on Site Characterization ISC-4 (01.01.2013)
Conference Proceeding
(Invited) Extending Advanced CMOS Scaling with SiGe Channel Materials
Carter, Rick J, Sporer, Ryan, McArdle, Timothy J, Mulfinger, George Robert, Holt, Judson Robert, Beasor, Scott, Child, Amy, Fronheiser, Jody, Wahl, Jeremy A, Geisler, Holm, Kluth, George J, Triyoso, Dina H, Punchihewa, Kasun, Rana, Uzma, Vanamurthy, Laks, Sohn, D K
Published in ECS transactions (09.04.2018)
Published in ECS transactions (09.04.2018)
Get full text
Journal Article