Search Results - "WENBING KANG" :: K.UTB vyhledávací portál

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Photoresist material containing acrylate side chain as well as preparation method and application of photoresist material

by KANG WENBING, LIU JUNJUN
Year of Publication 14.03.2023

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Highly-heat-resistant photoresist composition and preparation method thereof

by KANG WENBING
Year of Publication 19.03.2019

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Heat-resistant photoresist composition

by KANG WENBING
Year of Publication 14.09.2018

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Negative photoresist based on pyrogallol derivative, preparation method of negative photoresist and application of negative photoresist in preparation of transparent conductive film

by WANG QIANQIAN, CHEN HUAN, KANG WENBING, WANG HAIHUA, GUO XUBIN
Year of Publication 26.04.2024

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Photosensitive polyimide precursor material with double functions, preparation method of photosensitive polyimide precursor material and application of photosensitive polyimide precursor material in photoetching

by YAN ZHENG, CHEN HUAN, KANG WENBING, WANG HAIHUA, KONG HUITING
Year of Publication 11.04.2023

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Printing plate material exposure post-treatment baking device

by KANG WENBING, WANG HEXIN, XU LEFENG
Year of Publication 20.09.2022

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Photosensitive resist for negative printing plate material and printing lithographic plate material

by KANG WENBING, XU LUBO, SUN BIN
Year of Publication 22.07.2022

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Positive photoetching material based on tannic acid, preparation method of positive photoetching material, photoresist system and application of positive photoetching material in preparation of micro-nano circuit

by TANG ZICHENG, CHEN HUAN, KANG WENBING, ZHAO LIPING
Year of Publication 01.03.2022

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Resist pattern formating method

by WANG XIAOWEI, KANG WENBING, MATSUURA YURIKO
Year of Publication 31.12.2013

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A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTAM

by MUTHIAH THIYAGARAJAN, CAO, YI, HONG, SUNGEUN, DAMMEL, RALPH R, KANG, WENBING, ANYADIEGWU, CLEMENT
Year of Publication 15.09.2016

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COMPOSITION FOR FORMING SILICON-CONTAINING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME

by DAMMEL RALPH R, SHIMIZU YASUO, KANG WENBING, ISHIKAWA TOMONORI
Year of Publication 30.01.2014

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RESIST PATTERN FORMATING METHOD

by WANG XIAOWEI, KANG WENBING, MATSUURA YURIKO
Year of Publication 06.10.2011

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SUBSTRATE PROCESSING LIQUID AND METHOD FOR PROCESSING RESIST SUBSTRATE USING SAME

by WANG XIAOWEI, KANG WENBING, MATSUURA YURIKO, KOIKE TOHRU, KATAYAMA TOMOHIDE
Year of Publication 21.11.2012

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Composition for coating over a photoresist pattern comprising a lactam

by DAMMEL RALPH R, THIYAGARAJAN MUTHIAH, KANG WENBING, CAO YI, HONG SUNGEUN, ANYADIEGWU CLEMENT
Year of Publication 04.02.2015

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A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTAM

by MUTHIAH THIYAGARAJAN, CAO, YI, HONG, SUNGEUN, DAMMEL, RALPH R, KANG, WENBING, ANYADIEGWU, CLEMENT
Year of Publication 15.12.2014

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SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION

by DAMMEL RALPH R, SHIMIZU YASUO, KANG WENBING, ISHIKAWA TOMONORI
Year of Publication 19.07.2012

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Photosensitive resin composition, preparation method thereof, photosensitive organic carrier, and yellow light slurry

by SUN SHENGYAN, WU PEIMING, KANG WENBING, XU DI, DONG PENGCHENG, GAO HUI
Year of Publication 13.11.2020

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SUBSTRATE PROCESSING LIQUID AND METHOD FOR PROCESSING RESIST SUBSTRATE USING SAME

by WANG XIAOWEI, KANG WENBING, MATSUURA YURIKO, KOIKE TOHRU, KATAYAMA TOMOHIDE
Year of Publication 13.07.2011

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SUBSTRATE TREATING SOLUTION AND METHOD EMPLOYING THE SAME FOR TREATING A RESIST SUBSTRATE

by WANG XIAOWEI, KANG WENBING, MATSUURA YURIKO, KOIKE TOHRU, KATAYAMA TOMOHIDE
Year of Publication 07.07.2011

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Composition for Coating over a Photoresist Pattern Comprising a Lactam

by DAMMEL RALPH R, THIYAGARAJAN MUTHIAH, KANG WENBING, CAO YI, HONG SUNGEUN, ANYADIEGWU CLEMENT
Year of Publication 30.08.2012

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