LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOLUTION
BAI, Kunlun, ZHANG, Cao, GRAVES, John S, BUROV, Anatoly, VUKKADALA, Pradeep, LI, Xiaohan, PARSEY, Guy, BIAFORE, John
Year of Publication 22.02.2024
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Year of Publication 22.02.2024
Patent