Application of self-aligned CoSi/sub 2/ interconnection in submicrometer CMOS transistors
Broadbent, E.K., Irani, R.F., Morgan, A.E., Maillot, P.
Published in IEEE transactions on electron devices (01.11.1989)
Published in IEEE transactions on electron devices (01.11.1989)
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Journal Article
Interfacial structure of tungsten layers formed by selective low pressure chemical vapor deposition
STACY, W. T, BROADBENT, E. K, NORCOTT, M. H
Published in Journal of the Electrochemical Society (01.02.1985)
Published in Journal of the Electrochemical Society (01.02.1985)
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Journal Article
Self-aligned silicided (PtSi and CoSi2) ultra-shallow p+/n junctions
Broadbent, E.K., Delfino, M., Morgan, A.E., Sadana, D.K., Maillot, P.
Published in IEEE electron device letters (01.07.1987)
Published in IEEE electron device letters (01.07.1987)
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Journal Article
Characterization of titanium silicide films formed by composite sputtering and rapid thermal annealing
Broadbent, E.K., Morgan, A.E., Coulman, B., Huang, I.-W., Kuiper, A.E.T.
Published in Thin solid films (20.07.1987)
Published in Thin solid films (20.07.1987)
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Journal Article