Reliability characterization of 32nm high-K and Metal-Gate logic transistor technology
Sangwoo Pae, Ashok, Ashwin, Jingyoo Choi, Ghani, T, Jun He, Seok-hee Lee, Lemay, K, Liu, M, Lu, R, Packan, P, Parker, C, Purser, R, St. Amour, Anthony, Woolery, B
Published in 2010 IEEE International Reliability Physics Symposium (01.01.2010)
Published in 2010 IEEE International Reliability Physics Symposium (01.01.2010)
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