Chemical mechanical polishing of low dielectric constant oxide films deposited using Flowfill chemical vapor deposition technology
HAO CUI, BHAT, Ishwara B, MURARKA, Shyam P, HONGQIANG LU, WEIDAN LI, HSIA, Wei-Jen, CATABAY, Wilbur
Published in Journal of the Electrochemical Society (01.10.2000)
Published in Journal of the Electrochemical Society (01.10.2000)
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