Effect of working power and pressure on plasma properties during the deposition of TiN films in reactive magnetron sputtering plasma measured using Langmuir probe measurement
How, Soo Ren, Nayan, Nafarizal, Ahmad, Mohd Khairul, Soon, Chin Fhong, Sahdan, Mohd Zainizan, Lias, Jais, Abu Bakar, Ahmad Shuhaimi, Md Arshad, Mohd Khairuddin, Hashim, Uda, Ahmad, Mohd Yazid
Published in Journal of physics. Conference series (01.04.2018)
Published in Journal of physics. Conference series (01.04.2018)
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