Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment
Louis, E., Voorma, H.-J., Koster, N.B., Shmaenok, L., Bijkerk, F., Schlatmann, R., Verhoeven, J., Platonov, Yu.Ya, van Dorssen, G.E., Padmore, H.A.
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
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Journal Article
A high-power, low-contamination laser plasma source for Extreme UV lithography
Bijkerk, F., Shmaenok, L.A., Shevelko, A.P., Bastiaensen, R.K.F.J., Bruineman, C., van Honk, A.G.J.R.
Published in Microelectronic engineering (01.02.1995)
Published in Microelectronic engineering (01.02.1995)
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Conference Proceeding
Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks
Bijkerk, F., Shmaenok, L.A., Louis, E., Voorma, H.J., Koster, N.B., Bruineman, C., Bastiaensen, R.K.F.J., van der Drift, E.W.J.M., Romijn, J., de Groot, L.E.M., Rousseeuw, B.A.C., Zijlstra, T., Platonov, Yu.Ya, Salashchenko, N.N.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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Journal Article
Conference Proceeding
Issues of laser plasma sources for soft x-ray projection lithography
Shmaenok, L., Bijkerk, F., Louis, E., van Honk, A., van der Wiel, M.J., Platonov, Yu, Shevelko, A., Mitrofanov, A., Frowein, H., Nicolaus, B., Voβ, F., Désor, R.
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
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Journal Article
Soft x-ray projection lithography using a high repetition rate laser-induced x-ray source for sub- 100 nanometer lithography processes
Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H.-J., van der Wiel, M.J., Schlatmann, R., Verhoeven, J., van der Drift, E.W.J.M., Romijn, J., Rousseeuw, B.A.C., Voβ, F., Desor, R., Nikolaus, B.
Published in Microelectronic engineering (01.04.1993)
Published in Microelectronic engineering (01.04.1993)
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Overview of Core Diagnostics for TEXTOR
Donné, A. J. H., de Bock, M. F. M., Classen, I. G. J., Von Hellermann, M. G., Jakubowska, K., Jaspers, R., Barth, C. J., Van Der Meiden, H. J., Oyevaar, T., Van De Pol, M. J., Varshney, S. K., Bertschinger, G., Biel, W., Busch, C., Finken, K. H., Koslowski, H. R., KrÄmer-Flecken, A., Kreter, A., Liang, Y., Oosterbeek, H., Zimmermann, O., Telesca, G., Verdoolaege, G., Domier, C. W., Luhmann, N. C., Mazzucato, E., Munsat, T., Park, H., Kantor, M., Kouprienko, D., Alexeev, A., Ohdachi, S., Korsholm, S., Woskov, P., Bindslev, H., Meo, F., Michelsen, P. K., Michelsen, S., Nielsen, S. K., Tsakadze, E., Shmaenok, L.
Published in Fusion science and technology (01.02.2005)
Published in Fusion science and technology (01.02.2005)
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