TiN/TiSi2 formation using TiNx layer and its feasibilities in ULSI
JEONG SOO BYUN, CHANG REOL KIM, KWAN GOO RHA, JAE JEONG KIM, WOO SHIK KIM
Published in Japanese journal of applied physics (1995)
Published in Japanese journal of applied physics (1995)
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Conference Proceeding
Annealing effects of polycrystalline silicon gate on electrical properties of thin gate oxide
Cho, Won-Ju, Kim, Eung-Soo, Kang, Jun-Jin, Rha, Kwan-Goo, Kim, Hong-Seok
Published in Solid-state electronics (01.04.1998)
Published in Solid-state electronics (01.04.1998)
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Journal Article
TiN/TiSi 2 Formation Using TiN x Layer and Its Feasibilities in ULSI
Byun, Jeong Soo, Kim, Chang Reol, Rha, Kwan Goo, Kim, Jae Jeong, Woo Shik Kim, Woo Shik Kim
Published in Japanese Journal of Applied Physics (01.02.1995)
Published in Japanese Journal of Applied Physics (01.02.1995)
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Journal Article
Enhanced EM endurance of TiN/AlCu/TiN/sub x/ interconnection
Jeong Soo Byun, Jun Ki Kim, Kwan Goo Rha, Woo Shik Kim
Published in Proceedings of 1994 IEEE International Integrated Reliability Workshop (IRWS) (1994)
Published in Proceedings of 1994 IEEE International Integrated Reliability Workshop (IRWS) (1994)
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Conference Proceeding