The Influence of Capping Layers on Tunneling Magnetoresistance and Microstructure in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions upon Annealing
Kim, Geunwoo, Lee, Soogil, Lee, Sanghwa, Song, Byonggwon, Lee, Byung-Kyu, Lee, Duhyun, Lee, Jin Seo, Lee, Min Hyeok, Kim, Young Keun, Park, Byong-Guk
Published in Nanomaterials (Basel, Switzerland) (01.09.2023)
Published in Nanomaterials (Basel, Switzerland) (01.09.2023)
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Journal Article
All-solid-state spatial light modulator with independent phase and amplitude control for three-dimensional LiDAR applications
Park, Junghyun, Jeong, Byung Gil, Kim, Sun Il, Lee, Duhyun, Kim, Jungwoo, Shin, Changgyun, Lee, Chang Bum, Otsuka, Tatsuhiro, Kyoung, Jisoo, Kim, Sangwook, Yang, Ki-Yeon, Park, Yong-Young, Lee, Jisan, Hwang, Inoh, Jang, Jaeduck, Song, Seok Ho, Brongersma, Mark L., Ha, Kyoungho, Hwang, Sung-Woo, Choo, Hyuck, Choi, Byoung Lyong
Published in Nature nanotechnology (01.01.2021)
Published in Nature nanotechnology (01.01.2021)
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Journal Article
The fabrication of Co–Pt electro-deposited bit patterned media with nanoimprint lithography
Sohn, Jin-Seung, Lee, Duhyun, Cho, Eunhyoung, Kim, Hae-Sung, Lee, Byung-Kyu, Lee, Myung-Bok, Suh, Su-Jeong
Published in Nanotechnology (14.01.2009)
Published in Nanotechnology (14.01.2009)
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Journal Article
Fabrication and MFM study of 60 nm track-pitch discrete track media
Sohn, Jin-Seung, Lee, Duhyun, Cho, Eunhyoung, Kim, Hae-Sung, Sul, SangChul, Lee, Byung-Kyu, Lee, MyungBok, Moon, Changyoul, Park, No-Cheol
Published in Nanotechnology (21.01.2011)
Published in Nanotechnology (21.01.2011)
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Journal Article
Non-sticky silicate replica mold by phase conversion approach for nanoimprint lithography applicationsElectronic supplementary information (ESI) available: Characterisation information and supplementary Figs S1-4. See DOI: 10.1039/c0jm01760d
Park, Sungjune, Park, Hyun-Ha, Han, Oc Hee, Chae, Seen Ae, Lee, Duhyun, Kim, Dong-Pyo
Year of Publication 02.11.2010
Year of Publication 02.11.2010
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Journal Article
Electrically Reconfigurable Active Metasurface for 3D Distance Ranging
Kim, Sun Il, Park, Junghyun, Jeong, Byung Gil, Lee, Duhyun, Kim, Jungwoo, Shin, Changgyun, Lee, Chang Bum, Otsuka, Tatsuhiro, Kim, Sangwook, Yang, Ki-Yeon, Park, Yong-Young, Lee, Jisan, Hwang, Inoh, Jang, Jaeduck, Ha, Kyoungho, Choo, Hyuck, Choi, Byoung Lyong, Hwang, Sung-Woo
Published in 2020 IEEE International Electron Devices Meeting (IEDM) (12.12.2020)
Published in 2020 IEEE International Electron Devices Meeting (IEDM) (12.12.2020)
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