Mask Effects on Resist Variability in Extreme Ultraviolet Lithography
Pret, Alessandro Vaglio, Gronheid, Roel, Engelen, Jan, Yan, Pei-Yang, Leeson, Michael J, Younkin, Todd R, Garidis, Konstantinos, Biafore, John
Published in Japanese Journal of Applied Physics (01.06.2013)
Published in Japanese Journal of Applied Physics (01.06.2013)
Get full text
Journal Article
A comprehensive EUV lithography model
Smith, Mark D, Graves, Trey, Biafore, John, Robertson, Stewart, Kim, Cheolkyun, Moon, James, Kim, Jaeheou, Bok, Cheolkyu, Yim, Donggyu
Published in Solid state technology (01.01.2012)
Get full text
Published in Solid state technology (01.01.2012)
Magazine Article