Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)
KIRCHMEYER, STEPHAN, VOLZ, KERSTIN, SUNDERMEYER, JOERG, POKOJ, MICHAEL, REUTER, KNUD, GAESS, DANIEL, OCHS, THOMAS, STOLZ, WOLFGANG
Year of Publication 16.08.2008
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Year of Publication 16.08.2008
Patent
Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD)
VOLZ, KERSTIN, SUNDERMEYER, JOERG, POKOJ, MICHAEL, REUTER, KNUD, OCHS, THOMAS, MERKOULOV, ALEXEI, STOLZ, WOLFGANG
Year of Publication 16.10.2007
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Year of Publication 16.10.2007
Patent
Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)
VOLZ, KERSTIN, SUNDERMEYER, JOERG, POKOJ, MICHAEL, REUTER, KNUD, OCHS, THOMAS, MERKOULOV, ALEXEI, STOLZ, WOLFGANG
Year of Publication 01.05.2007
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Year of Publication 01.05.2007
Patent