Wafer Edge Protection Layer: A Solution for Metal Contamination Issue in Advanced Patterning Process
Kudo, Takanori, Cho, JoonYeon, Hishida, Aritaka, Mullen, Salem, Wolfer, Elizabeth, Polishchuk, Orest, Antonio, Charito, Li, Zhong
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Published in Journal of Photopolymer Science and Technology (25.06.2024)
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Journal Article
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist
Li, Zhong, Kampitakisa, Viktor, Her, Youngjun, Antonio, Charito, Kudo, Takanori, Mullen, Salem, Muthuswamy, Elayaraja, Polishchuk, Orest, Ware, Adam, Wolfer, Elizabeth, Yang, Dong, Cho, JoonYeon, Hishida, Aritaka
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Published in Journal of Photopolymer Science and Technology (25.06.2024)
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Journal Article
Progress in Spin-on Hard Mask Materials for Advanced Lithography
Padmanaban, Munirathna, Cho, JoonYeon, Kudo, Takanori, Rahman, Dalil, Yao, Huirong, McKenzie, Douglas, Dioses, Alberto, Mullen, Salem, Wolfer, Elizabeth, Yamamoto, Kazuma, Cao, Yi, Her, YoungJun
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
PAG and Quencher Effects on DBARC Performance
Padmanaban, Murirathna, Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Neisser, Mark, Miyazaki, Shinji, Miyamoto, Kazma, Akiyama, Yasushi, Ishizu, Yuko
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Journal Article
Advances and Challenges in Developable Bottom Anti-Reflective Coating (DBARC)
Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Antonio, Charito, Parthasarathy, Deepa, Miyazaki, Shinji, Yamamoto, Kazuma, Akiyama, Yasushi, Collett, Richard, Neisser, Mark, Padmanaban, Murirathna
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Novel Diamantane Polymer Platform for Resist Applications
Padmanaban, Murirathna, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph, Liu, Shenggao, Lam, Feederick, Maehara, Takayuki, Iwasaki, Fimiaki, Yamaguchi, Masao
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography
Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van
Published in Journal of photopolymer science and technology (2007)
Published in Journal of photopolymer science and technology (2007)
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Journal Article
Contact Hole Resist Solutions for 45-90nm Node Design Rules
Padmanaban, Murirathna, Kudo, Takamori, Lin, Guanyang, Hong, Sungeun, Nishibe, Takeshi, Takano, Yusuke
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
기판 위에 편석층을 제조하는 방법, 및 소자를 제조하는 방법
DAMMEL RALPH R, OCYTKO KORNEL, HUDSON DANIEL, MORSE GRAHAM, KUDO TAKANORI, WANG CHANGSHENG, JEFFERY BEN
Year of Publication 14.11.2022
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Year of Publication 14.11.2022
Patent
Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters
Houlihan, Francis M., Rentkiewicz, David, Lin, Guanyang, Rahman, Dalil, Mackenzie, Dougls, Timko, Allen, Kudo, Takanori, Anyadiegwu, Clement, Thiyqarqjan, Muthiah, Chiu, Simon, Romano, Andrew, Dammel, Rqlph R., Padmanaban, Murirathna
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
METHOD FOR SOLDERING THICK COPPER MULTILAYER SUBSTRATE
KUDO TAKANORI, KIMURA TOSHIFUMI, NISHIGAKI KAZUHIRO, KIKUCHI YUJI, MIYAMOTO ATSUSHI
Year of Publication 30.04.2020
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Year of Publication 30.04.2020
Patent
노볼락/DNQ 기반의 화학 증폭형 포토레지스트
CHEN HUNG YANG, YIN JIAN, KUDO TAKANORI, LIU WEIHONG, TOUKHY MEDHAT A
Year of Publication 03.02.2021
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Year of Publication 03.02.2021
Patent
Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity
Padmanaban, Munirathna, Anyadiegwu, Clement, Kanda, Takashi, Kim, Woo-Kyu, Kudo, Takanori, McKenzie, Douglas, Rahman, Dalil, Dammel, Ralph, Lee, SangHo
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article
PIGMENTED PHOTORESISTS FOR COLOR FILTERS
Kudo, Takanori, Nanjo, Yuki, Nozaki, Yuko, Nagao, Kazuya, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article