Influence of H2O partial pressure in the sputtering chamber on the crystallinity and relative dielectric constant of SrTiO3 thin film prepared at low substrate temperature
Nakagawara, Osamu, Fujibayashi, Kei, Makino, Takahiro, Katayama, Yuzo
Published in Vacuum (01.11.2000)
Published in Vacuum (01.11.2000)
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