X-Ray lithography mask metrology: use of transmitted electrons in an SEM for linewidth measurement
POSTEK, M. T, LOWNEY, J. R, VLADAR, A. E, KEERY, W. J, MARX, E, LARRABEE, R. D
Published in Journal of research of the National Institute of Standards and Technology (01.07.1993)
Published in Journal of research of the National Institute of Standards and Technology (01.07.1993)
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Journal Article
A new approach to accurate X-ray mask measurements in a scanning electron microscope
Postek, M.T., Larrabee, R.D., Keery, W.J.
Published in IEEE transactions on electron devices (01.11.1989)
Published in IEEE transactions on electron devices (01.11.1989)
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Submicrometer microelectronics dimensional metrology: scanning electron microscopy
Postek, M.T., Joy, D.C.
Published in Journal of research of the National Bureau of Standards (1977) (01.05.1987)
Published in Journal of research of the National Bureau of Standards (1977) (01.05.1987)
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Journal Article