MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si
Black, Kate, Jones, Anthony C., Chalker, Paul R., Gaskell, Jeffrey M., Murray, Robert T., Joyce, Tim B., Rushworth, Simon A.
Published in Journal of crystal growth (01.03.2008)
Published in Journal of crystal growth (01.03.2008)
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Conference Proceeding
Atomic vapour deposition (AVD) of SrBi2Ta2O9 using an all alkoxide precursor
CHALKER, Paul R, POTTER, Richard J, ROBERTS, John L, JONES, Anthony C, SMITH, Lesley M, SCHUMACHER, Marcus
Published in Journal of crystal growth (01.12.2004)
Published in Journal of crystal growth (01.12.2004)
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Conference Proceeding
Journal Article
Thermal stability of hafnium silicate dielectric films deposited by a dual source liquid injection MOCVD
CHALKER, Paul R, MARSHALL, Paul A, POTTER, Richard J, JOYCE, Timothy B, JONES, Anthony C, TAYLOR, Stephen, NOAKES, Timothy C. Q, BAILEY, P
Published in Journal of materials science. Materials in electronics (01.11.2004)
Published in Journal of materials science. Materials in electronics (01.11.2004)
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Conference Proceeding
Journal Article
Capacitance-voltage characteristics measured through pulse technique on high-k dielectric MOS devices
Lu, Qifeng, Qi, Yanfei, Zhao, Ce Zhou, Zhao, Chun, Taylor, Stephen, Chalker, Paul R.
Published in Vacuum (01.06.2017)
Published in Vacuum (01.06.2017)
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