Wet process for semiconductor device fabrication using anode water containing oxidative substances and cathode water containing reductive substances, and anode water and cathode water used in the wet process
Lee, Kun-Tack, Park, Im-Soo, Kwon, Young-Min, Hah, Sang-Rok, Shim, Woo-Gwan, Ko, Hyung-Ho
Year of Publication 07.03.2002
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Year of Publication 07.03.2002
Patent