Effect of Molecular Weights of 193nm Resist Polymers on the Negative Tone Development Process
Bae, Young C., Lee, Seung-Hyun, Bell, Rosemary, Park, Jong Keun, Cardolaccia, Thomas, LIu, Yi, Sun, Jibin, Andes, Cecily, Kim, Young Seok, Barclay, Georgee G.
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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