Real-time and on-site γ-ray radiation response testing system for semiconductor devices and its applications
Mu, Yifei, Zhao, Ce Zhou, Qi, Yanfei, Lam, Sang, Zhao, Chun, Lu, Qifeng, Cai, Yutao, Mitrovic, Ivona Z., Taylor, Stephen, Chalker, Paul R.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.04.2016)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.04.2016)
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Journal Article
Molecular design of improved precursors for the MOCVD of oxides used in microelectronics
Jones, Anthony C., Aspinall, Helen C., Chalker, Paul R.
Published in Surface & coatings technology (25.09.2007)
Published in Surface & coatings technology (25.09.2007)
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Journal Article
Conference Proceeding
Electrochemistry at boron-doped diamond films grown on graphite substrates: redox-, adsorption and deposition processes
Goeting, Christiaan H, Jones, Frances, Foord, John S, Eklund, John C, Marken, Frank, Compton, Richard G, Chalker, Paul R, Johnston, Colin
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (01.01.1998)
Published in Journal of electroanalytical chemistry (Lausanne, Switzerland) (01.01.1998)
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Journal Article
MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si
Black, Kate, Jones, Anthony C., Chalker, Paul R., Gaskell, Jeffrey M., Murray, Robert T., Joyce, Tim B., Rushworth, Simon A.
Published in Journal of crystal growth (01.03.2008)
Published in Journal of crystal growth (01.03.2008)
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Journal Article
Conference Proceeding
Recent developments in the MOCVD and ALD of rare earth oxides and silicates
Jones, Anthony C., Aspinall, Helen C., Chalker, Paul R., Potter, Richard J., Kukli, Kaupo, Rahtu, Antti, Ritala, Mikko, Leskelä, Markku
Published in Materials science & engineering. B, Solid-state materials for advanced technology (25.04.2005)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (25.04.2005)
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Journal Article
Liquid injection MOCVD and ALD of ZrO2 using Zr-cyclopentadienyl precursors
GASKELL, Jeffrey M, JONES, Anthony C, BLACK, Kate, CHALKER, Paul R, LEESE, Thomas, KINGSLEY, Andrew, ODEDRA, Rajesh, HEYS, Peter N
Published in Surface & coatings technology (25.09.2007)
Published in Surface & coatings technology (25.09.2007)
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Conference Proceeding
Journal Article
Atomic vapour deposition (AVD) of SrBi2Ta2O9 using an all alkoxide precursor
CHALKER, Paul R, POTTER, Richard J, ROBERTS, John L, JONES, Anthony C, SMITH, Lesley M, SCHUMACHER, Marcus
Published in Journal of crystal growth (01.12.2004)
Published in Journal of crystal growth (01.12.2004)
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Conference Proceeding
Journal Article
Capacitance-voltage characteristics measured through pulse technique on high-k dielectric MOS devices
Lu, Qifeng, Qi, Yanfei, Zhao, Ce Zhou, Zhao, Chun, Taylor, Stephen, Chalker, Paul R.
Published in Vacuum (01.06.2017)
Published in Vacuum (01.06.2017)
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Journal Article
Heteroleptic titanium alkoxides as single-source precursors for MOCVD of micro-structured TiO2
Ashraf, Sobia, Aspinall, Helen C., Bacsa, John, Chalker, Paul R., Davies, Hywel O., Jones, Anthony C., O’Brien, Paul, Wrench, Jacqueline S.
Published in Polyhedron (08.01.2015)
Published in Polyhedron (08.01.2015)
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Journal Article
Erratum to “MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si” [J. Cryst. Growth 310 (2008) 1010–1014]
Black, Kate, Jones, Antony C., Chalker, Paul R., Gaskell, Jeffrey M., Murrey, Robert T., Joyce, Tim B., Rushworth, Simon A.
Published in Journal of crystal growth (01.12.2009)
Published in Journal of crystal growth (01.12.2009)
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Journal Article
Erratum to: “Atomic vapour deposition (AVD) of SrBi2Ta2O9 using an all alkoxide precursor system” [J. Crystal Growth 272 (2004) 778]
Chalker, Paul R., Potter, Richard J., Roberts, John L., Jones, Anthony C., Smith, Lesley M., Schumacher, Marcus
Published in Journal of crystal growth (01.03.2005)
Published in Journal of crystal growth (01.03.2005)
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Journal Article
Erratum to: “Atomic vapour deposition (AVD) of SrBi 2Ta 2O 9 using an all alkoxide precursor system” [J. Crystal Growth 272 (2004) 778]
Chalker, Paul R., Potter, Richard J., Roberts, John L., Jones, Anthony C., Smith, Lesley M., Schumacher, Marcus
Published in Journal of crystal growth (2005)
Published in Journal of crystal growth (2005)
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Journal Article
Polycrystalline diamond films for acoustic wave devices
Whitfield, Michael D., Audic, Barbara, Flannery, Colm M., Kehoe, Liam P., Crean, Gabriel M., Johnston, Colin, Chalker, Paul R., Jackman, Richard B.
Published in Diamond and related materials (01.02.1998)
Published in Diamond and related materials (01.02.1998)
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Journal Article
Thin film diamond metal-insulator field effect transistor for high temperature applications
Pang, Lisa Y.S., Chan, Simon S.M., Chalker, Paul R., Johnston, Colin, Jackman, Richard B.
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.04.1997)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.04.1997)
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Journal Article