Etching characteristics and modeling for oval-shaped contact
Park, Sung-Chan, Lim, Seok-Hyun, Shin, Chul-Ho, Min, Gyung-Jin, Kang, Chang-Jin, Cho, Han-Ku, Moon, Joo-Tae
Published in Thin solid films (23.04.2007)
Published in Thin solid films (23.04.2007)
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Journal Article
Conference Proceeding
Leakage current mechanisms in sub-50 nm recess-channel-type DRAM cell transistors with three-terminal gate-controlled diodes
CHUNG, Eun-Ae, KIM, Young-Pil, NAM, Kab-Jin, LEE, Sungsam, MIN, Ji-Young, SHIN, Yu-Gyun, CHOI, Siyoung, JIN, Gyoyoung, MOON, Joo-Tae, KIM, Sangsig
Published in Solid-state electronics (01.02.2011)
Published in Solid-state electronics (01.02.2011)
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Journal Article
Body-tied triple-gate NMOSFET fabrication using bulk Si wafer
Park, Tai-su, Choi, Siyoung, Lee, Deok-Hyung, Chung, U-In, Moon, Joo Tae, Yoon, Euijoon, Lee, Jong-Ho
Published in Solid-state electronics (01.03.2005)
Published in Solid-state electronics (01.03.2005)
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Journal Article
Development and evaluation of highly efficient neutral beam source
Hwang, Sung-Wook, Lee, Do-Haing, Shin, Chul Ho, Tokashiki, Ken, Min, Gyeong-Jin, Kang, Chang Jin, Cho, Han Ku, Moon, Joo Tae, Lee, Jinseok, Jeon, Yunkwang, Lee, Yvette, Kam, Doyoung
Published in Surface & coatings technology (05.08.2007)
Published in Surface & coatings technology (05.08.2007)
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Journal Article
Conference Proceeding
Investigation of Ni/Co bilayer salicidation process for sub-40 nm gate technology
Jung, Eun Ji, Jung, Sug-Woo, Kim, Hyun-Su, Yun, Jong-Ho, Cheong, Seong Hwee, Kim, Byung Hee, Choi, Gil Heyun, Kim, Sung Tae, Chung, U-In, Moon, Joo Tae, Ryu, Byung Il
Published in Microelectronic engineering (01.12.2005)
Published in Microelectronic engineering (01.12.2005)
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Journal Article
Conference Proceeding
Investigation of Ni/Co bilayer salicidation process for sub-40nm gate technology
Jung, Eun Ji, Jung, Sug-Woo, Kim, Hyun-Su, Yun, Jong-Ho, Cheong, Seong Hwee, Kim, Byung Hee, Choi, Gil Heyun, Kim, Sung Tae, Chung, U-In, Moon, Joo Tae, Ryu, Byung Il
Published in Microelectronic engineering (01.12.2005)
Published in Microelectronic engineering (01.12.2005)
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Journal Article
A study on the Pt electrode etching for 0.15 μm technologies
Kim, Hyoun-Woo, Ju, Byong-Sun, Kang, Chang-Jin, Moon, Joo-Tae
Published in Microelectronic engineering (01.01.2003)
Published in Microelectronic engineering (01.01.2003)
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Journal Article
Patterning of W/WNx/poly-Si gate electrode using Cl2/O2 plasmas
KIM, Hyoun-Woo, JU, Byong-Sun, KANG, Chang-Jin, MOON, Joo-Tae
Published in Microelectronic engineering (01.03.2003)
Published in Microelectronic engineering (01.03.2003)
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Journal Article
Elimination of surface state induced edge transistors in high voltage NMOSFETs for flash memory devices
Lee, Jin-Wook, Buh, Gyoung Ho, Yon, Guk-Hyon, Park, Tai-su, Shin, Yu Gyun, Chung, U-In, Moon, Joo-Tae
Published in Microelectronics and reliability (01.09.2005)
Published in Microelectronics and reliability (01.09.2005)
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Journal Article
Conference Proceeding
Characteristics of self bias voltage and poly-Si etching in pulsed helicon wave plasma
Kim, Jung-Hyung, Kang, Chang-Jin, Ahn, Tae-Hyuk, Moon, Joo-Tae
Published in Thin solid films (07.05.1999)
Published in Thin solid films (07.05.1999)
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Journal Article
Conference Proceeding
Leakage current mechanisms in sub-50nm recess-channel-type DRAM cell transistors with three-terminal gate-controlled diodes
Chung, Eun-Ae, Kim, Young-Pil, Nam, Kab-Jin, Lee, Sungsam, Min, Ji-Young, Shin, Yu-Gyun, Choi, Siyoung, Jin, Gyoyoung, Moon, Joo-Tae, Kim, Sangsig
Published in Solid-state electronics (01.02.2011)
Published in Solid-state electronics (01.02.2011)
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Journal Article
Engineering on tunnel barrier and dot surface in Si nanocrystal memories
Baik, Seung Jae, Choi, Siyoung, Chung, U-In, Moon, Joo Tae
Published in Solid-state electronics (01.09.2004)
Published in Solid-state electronics (01.09.2004)
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Journal Article
Low temperature crystallized Ta2O5/Nb2O5 bi-layers integrated into RIR capacitor for 60 nm generation and beyond
Cho, Kyuho, Lee, Jinil, Lim, Jae-Soon, Lim, Hanjin, Lee, Junghyun, Park, Sungho, Yoo, Cha-Young, Kim, Sung-Tae, Chung, U-In, Moon, Joo-Tae
Published in Microelectronic engineering (01.06.2005)
Published in Microelectronic engineering (01.06.2005)
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Journal Article
Conference Proceeding
Patterning of W/WN x/poly-Si gate electrode using Cl 2/O 2 plasmas
Kim, Hyoun-Woo, Ju, Byong-Sun, Kang, Chang-Jin, Moon, Joo-Tae
Published in Microelectronic engineering (2003)
Published in Microelectronic engineering (2003)
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Journal Article
Electrical analysis of DRAM cell transistors for the root-cause addressing of the tRDL time-delay failure
Pil Kim, Young, Chung, Uin, Tae Moon, Joo, Kim, Sang U.
Published in Microelectronics and reliability (01.09.2003)
Published in Microelectronics and reliability (01.09.2003)
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Journal Article
A comparative analysis of thermal gate oxide on strained Si/relaxed SiGe layer for reliability prediction of strained Si MOSFETs
Lee, Sun-Ghil, Kim, Young Pil, Lee, Hye-Lan, Jin, Beom Jun, Lee, Jong-Wook, Shin, Yu Gyun, Choi, Siyoung, Chung, U-In, Moon, Joo Tae
Published in Materials science in semiconductor processing (01.02.2005)
Published in Materials science in semiconductor processing (01.02.2005)
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Journal Article