Effect of disclosing the relation between effort and unit reliability on system reliability: An economic experiment
Makino, Ryoji, Akai, Kenju, Takeshita, Jun-Ichi, Kudo, Takanori, Aoki, Keiko
Published in PloS one (07.04.2021)
Published in PloS one (07.04.2021)
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Journal Article
Wafer Edge Protection Layer: A Solution for Metal Contamination Issue in Advanced Patterning Process
Kudo, Takanori, Cho, JoonYeon, Hishida, Aritaka, Mullen, Salem, Wolfer, Elizabeth, Polishchuk, Orest, Antonio, Charito, Li, Zhong
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Published in Journal of Photopolymer Science and Technology (25.06.2024)
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Journal Article
Two Cases of Hypopituitarism Caused by Intrasellar Aneurysm
Kageyama, Kazunori, Kinoshita, Noriko, Terui, Ken, Moriyama, Takako, Kudo, Takanori, Daimon, Makoto
Published in Internal Medicine (01.03.2020)
Published in Internal Medicine (01.03.2020)
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Journal Article
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist
Li, Zhong, Kampitakisa, Viktor, Her, Youngjun, Antonio, Charito, Kudo, Takanori, Mullen, Salem, Muthuswamy, Elayaraja, Polishchuk, Orest, Ware, Adam, Wolfer, Elizabeth, Yang, Dong, Cho, JoonYeon, Hishida, Aritaka
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Published in Journal of Photopolymer Science and Technology (25.06.2024)
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Journal Article
Progress in Spin-on Hard Mask Materials for Advanced Lithography
Padmanaban, Munirathna, Cho, JoonYeon, Kudo, Takanori, Rahman, Dalil, Yao, Huirong, McKenzie, Douglas, Dioses, Alberto, Mullen, Salem, Wolfer, Elizabeth, Yamamoto, Kazuma, Cao, Yi, Her, YoungJun
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
PAG and Quencher Effects on DBARC Performance
Padmanaban, Murirathna, Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Neisser, Mark, Miyazaki, Shinji, Miyamoto, Kazma, Akiyama, Yasushi, Ishizu, Yuko
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Journal Article
Advances and Challenges in Developable Bottom Anti-Reflective Coating (DBARC)
Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Antonio, Charito, Parthasarathy, Deepa, Miyazaki, Shinji, Yamamoto, Kazuma, Akiyama, Yasushi, Collett, Richard, Neisser, Mark, Padmanaban, Murirathna
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Novel Diamantane Polymer Platform for Resist Applications
Padmanaban, Murirathna, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph, Liu, Shenggao, Lam, Feederick, Maehara, Takayuki, Iwasaki, Fimiaki, Yamaguchi, Masao
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography
Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van
Published in Journal of photopolymer science and technology (2007)
Published in Journal of photopolymer science and technology (2007)
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Journal Article
Two Cases of Hypopituitarism Caused by Intrasellar Aneurysm
Kageyama, Kazunori, Kinoshita, Noriko, Terui, Ken, Moriyama, Takako, Kudo, Takanori, Daimon, Makoto
Published in Internal Medicine (2020)
Published in Internal Medicine (2020)
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Journal Article
Contact Hole Resist Solutions for 45-90nm Node Design Rules
Padmanaban, Murirathna, Kudo, Takamori, Lin, Guanyang, Hong, Sungeun, Nishibe, Takeshi, Takano, Yusuke
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters
Houlihan, Francis M., Rentkiewicz, David, Lin, Guanyang, Rahman, Dalil, Mackenzie, Dougls, Timko, Allen, Kudo, Takanori, Anyadiegwu, Clement, Thiyqarqjan, Muthiah, Chiu, Simon, Romano, Andrew, Dammel, Rqlph R., Padmanaban, Murirathna
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity
Padmanaban, Munirathna, Anyadiegwu, Clement, Kanda, Takashi, Kim, Woo-Kyu, Kudo, Takanori, McKenzie, Douglas, Rahman, Dalil, Dammel, Ralph, Lee, SangHo
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article
PIGMENTED PHOTORESISTS FOR COLOR FILTERS
Kudo, Takanori, Nanjo, Yuki, Nozaki, Yuko, Nagao, Kazuya, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
Optimization of DUV Negative Resists for 0.15 .MU.m Lithography
Kudo, Takanori, Aramaki, Kayo, Pawlowski, Georg
Published in Journal of photopolymer science and technology (1998)
Published in Journal of photopolymer science and technology (1998)
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Journal Article
Materials and Resists for 193 and 157nm Applications
Padmanaban, Munirathna, Alemy, Eric, Bae, Jun-Bom, Kim, Woo-Kyu, Kudo, Takanori, Masuda, Seiya, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
PIGMENTED PHOTORESIST FOR BLACK MATRIX
Kudo, Takanori, Nozaki, Yuko, Nanjo, Yuki, Yamaguchi, Hidemasa, Nagao, Kazuya, Okazaki, Hiroshi, Pawlowski, Georg
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
Etch Properties of 193nm Resists: Issues and Approaches
Padmanaban, Munirathna, Alemy, Eric, Dammel, Ralph, Kim, Woo-Kyu, Kudo, Takanori, Lee, SangHo, Rahman, Dalil, Chen, Wan-Lin, Sadjadi, Reza M., Livesay, William, Ross, Matthew
Published in Journal of Photopolymer Science and Technology (2002)
Published in Journal of Photopolymer Science and Technology (2002)
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Journal Article