A Physics-based Model for Negative Tone Development Materials
Fang, Chao, Smith, Mark D., Robertson, Stewart, Biafore, John J., Pret, Alessandro Vaglio
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Pursuit of Lower Critical Dimensional Uniformity in EUV Resists
Thackeray, James, Cameron, James, Jain, Vipul, LaBeaume, Paul, Coley, Suzanne, Ongayi, Owendi, Wagner, Mike, Rachford, Aaron, Biafore, John
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
Progress Towards Production Worthy EUV Photoresists: Balancing Litho, Outgassing and OOB Performance
Cameron, James, Thackeray, James, Jain, Vipul, LaBeaume, Paul, Coley, Suzanne, Ongayi, Owendi, Wagner, Mike, Biafore, John
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
Understanding the Role of Acid vs. Electron Blur in EUV Resist Materials
Thackeray, James W., Wagner, Mike, Kang, Su Jun, Biafore, John
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Advances in Low Diffusion EUV Resists
Thackeray, James W., Cameron, James F., Wagner, Michael, Coley, Suzanne, Labeaume, Vipu Paul, Ongayi, Owndi, Montgomery, Warren, Lovell, Dave, Biafore, John, Chakrapane, Vidhya, Ko, Akiteru
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Design Considerations for Anti-reflection Layer in Thin Imaging System
Malik, Sanjay, De, Binod, Biafore, John, Spaziano, Greg, Sarubbi, Tom, Dilocker, Stephanie, Bowden, Murrae, Reybrouc, Mario, Grozev, Grozdan, Driessche, Veerle van, Tzviatkov, Plamen
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Progress Towards Production Worthy EUV Photoresists
Cameron, James, Thackeray, James, Jain, Vipul, LaBeaume, Paul, Coley, Suzanne, Ongayi, Owendi, Wagner, Mike, Biafore, John
Published in Journal of photopolymer science and technology (01.09.2014)
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Published in Journal of photopolymer science and technology (01.09.2014)
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Advances in Resist Materials for 193nm Lithography
Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Published in Journal of Photopolymer Science and Technology (30.05.1999)
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Journal Article
Advances in Resist Materials for 193 nm Lithography
Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa
Published in Journal of photopolymer science and technology (1999)
Published in Journal of photopolymer science and technology (1999)
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Journal Article
A comprehensive EUV lithography model
Smith, Mark D, Graves, Trey, Biafore, John, Robertson, Stewart, Kim, Cheolkyun, Moon, James, Kim, Jaeheou, Bok, Cheolkyu, Yim, Donggyu
Published in Solid state technology (01.01.2012)
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Published in Solid state technology (01.01.2012)
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