Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation
Wei-Yip Loh, Byung Jin Cho, Moon Sig Joo, Ming-Fu Li, Chan, D.S.H., Mathew, S., Dim-Lee Kwong
Published in IEEE transactions on device and materials reliability (01.12.2004)
Published in IEEE transactions on device and materials reliability (01.12.2004)
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