High-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors
Black, C.T., Guarini, K.W., Ying Zhang, Hyungjun Kim, Benedict, J., Sikorski, E., Babich, I.V., Milkove, K.R.
Published in IEEE electron device letters (01.09.2004)
Published in IEEE electron device letters (01.09.2004)
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Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes
Steen, Steven, McNab, Sharee J., Sekaric, Lidija, Babich, Inna, Patel, Jyotica, Bucchignano, Jim, Rooks, Michael, Fried, David M., Topol, Anna W., Brancaccio, Jim R., Yu, Roy, Hergenrother, John M., Doyle, James P., Nunes, Ron, Viswanathan, Raman G., Purushothaman, Sampath, Rothwell, Mary Beth
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Conference Proceeding
Measurement of the effective wavelength of x-ray lithography sources
Maldonado, Juan R., Babich, Inna, Hsia, L.C., Rippstein, R., Flamholz, A., DiMilia, Vincent
Published in Microelectronic engineering (01.04.1993)
Published in Microelectronic engineering (01.04.1993)
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Journal Article