Optical lithography here is why
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the...
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| Main Author | |
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| Corporate Author | |
| Format | Electronic eBook |
| Language | English |
| Published |
Bellingham, Wash. :
SPIE,
2010.
|
| Series | SPIE monograph ;
PM190. |
| Subjects | |
| Online Access | Plný text |
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| Summary: | This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. |
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| Physical Description: | 1 online zdroj (xiv, 477 pages) : illustrations. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9780819481825 9781615837274 9780819475602 |
| Access: | Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity |